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Synchronous plasma enhancement in RF-driven plasma source for ion implantationDIPLASU, C; SURMEIAN, A; GROZA, A et al.Surface & coatings technology. 2009, Vol 203, Num 19, pp 2858-2862, issn 0257-8972, 5 p.Article

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Methane conversion in the presence of oxygen under low-temperature radio frequency plasmaJINHAI YUAN; XUEJUN ZHONG; SHIYU TAN et al.Journal of natural gas chemistry. 2010, Vol 19, Num 6, pp 605-610, issn 1003-9953, 6 p.Article

Synthesis evaluation of nitrogen atom encapsulated fullerenes by optical emission spectra in nitrogen plasmasMIYANAGA, S; KANEKO, T; ISHIDA, H et al.Thin solid films. 2010, Vol 518, Num 13, pp 3509-3512, issn 0040-6090, 4 p.Conference Paper

Physicochemical differences after densifying radio frequency plasma sprayed hydroxyapatite powders using spark plasma and conventional sintering techniquesXU, J. L; KHOR, K-A; KUMAR, R et al.Materials science & engineering. A, Structural materials : properties, microstructure and processing. 2007, Vol 457, Num 1-2, pp 24-32, issn 0921-5093, 9 p.Article

Spectroscopic analysis of the interface chemistry of ultra-thin plasma polymer films on ironWAPNER, K; GRUNDMEIER, G.Surface & coatings technology. 2005, Vol 200, Num 1-4, pp 100-103, issn 0257-8972, 4 p.Conference Paper

Simulation of flow field and particle trajectory of radio frequency inductively coupled plasma spheroidizationLU XIN; LANG-PING, Zhu; ZHANG BING et al.Computational materials science. 2012, Vol 65, pp 13-18, issn 0927-0256, 6 p.Article

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Nitridation of aluminum particles and formation process of aluminum nitride coatings by reactive RF plasma sprayingYAMADA, Motohiro; YASUI, Toshiaki; FUKUMOTO, Masahiro et al.Thin solid films. 2007, Vol 515, Num 9, pp 4166-4171, issn 0040-6090, 6 p.Conference Paper

Room temperature radio-frequency plasma-enhanced pulsed laser deposition of ZnO thin filmsHUANG, S.-H; CHOU, Y.-C; CHOU, C.-M et al.Applied surface science. 2013, Vol 266, pp 194-198, issn 0169-4332, 5 p.Article

Fabrication of iron nitride coatings by reactive RF plasma sprayingYAMADA, Motohiro; KOUZAKI, Yoshihisa; YASUI, Toshiaki et al.Surface & coatings technology. 2006, Vol 201, Num 3-4, pp 1745-1751, issn 0257-8972, 7 p.Article

Plasma assisted pulsed laser deposition of hydroxylapatite thin filmsSOLLA, E. L; BORRAJO, J. P; GONZALEZ, P et al.Applied surface science. 2005, Vol 248, Num 1-4, pp 360-364, issn 0169-4332, 5 p.Conference Paper

Total toxicity equivalents emissions of SF₆, CHF₃, and CCl₂F₂ decomposed in a RF plasma environmentWANG, Ya-Fen; MINLIANG SHIH; TSAI, Cheng-Hsien et al.Chemosphere (Oxford). 2006, Vol 62, Num 10, pp 1681-1688, issn 0045-6535, 8 p.Article

Maintenance of Pluripotency in Human Embryonic Stem Cells Cultured on a Synthetic Substrate in Conditioned MediumMAHLSTEDT, Magdalena M; ANDERSON, David; SHARP, James S et al.Biotechnology and bioengineering. 2010, Vol 105, Num 1, pp 130-140, issn 0006-3592, 11 p.Article

The effect of hard nitridation on Al₂O₃ using a radio frequency operated plasma cellAGNARSSON, B; QI, B; GÖTHELID, M et al.Thin solid films. 2011, Vol 519, Num 22, pp 7796-7802, issn 0040-6090, 7 p.Article

Plasma Ionization in Low-Pressure Radio-Frequency Discharges-Part I: Optical MeasurementsO'CONNELL, Deborah; GANS, Timo; MEIGE, Albert et al.IEEE transactions on plasma science. 2008, Vol 36, Num 4, pp 1382-1383, issn 0093-3813, 2 p., 1Article

Structure modification of titanium oxide thin films by rf-plasma assistance in Ti-O₂ reactive dc and pulsed dc sputteringSAKAMOTO, Mune-Aki; KUSANO, Eiji; MATSUDA, Hiroaki et al.Thin solid films. 2013, Vol 531, pp 49-55, issn 0040-6090, 7 p.Article

Characterization of thin TiO₂ films prepared by plasma enhanced chemical vapour deposition for optical and photocatalytic applicationsSOBCZYK-GUZENDA, A; GAZICKI-LIPMAN, M; SZYMANOWSKI, H et al.Thin solid films. 2009, Vol 517, Num 18, pp 5409-5414, issn 0040-6090, 6 p.Article

Effects of experimental parameters on NF₃ decomposition fraction in an oxygen-based RF plasma environmentWANG, Ya-Fen; WANG, Lin-Chi; MINLIANG SHIH et al.Chemosphere (Oxford). 2004, Vol 57, Num 9, pp 1157-1163, issn 0045-6535, 7 p.Article

Photocatalytic characteristic and photodegradation kinetics of toluene using N-doped TiO₂ modified by radio frequency plasmaSHIE, Je-Lueng; LEE, Chiu-Hsuan; CHIOU, Chyow-San et al.Environmental technology. 2014, Vol 35, Num 5-8, pp 653-660, issn 0959-3330, 8 p.Article

Experimental and theoretical study of RF plasma at low and high frequencyRAKHIMOVA, Tatyana V; BRAGINSKY, Oleg V; IVANOV, Vladimir V et al.IEEE transactions on plasma science. 2006, Vol 34, Num 3, pp 867-877, issn 0093-3813, 11 p., 2Conference Paper

Device quality InO_x:Sn and InO_x thin films deposited at room temperature with different rf-power densitiesAMARAL, A; BROGUEIRA, P; CONDE, O et al.Thin solid films. 2012, Vol 526, pp 221-224, issn 0040-6090, 4 p.Article